Customization of High-purity Etching Solution for The Electronics Industry

Customer Requirements: 

A company focused on high-end chip manufacturing has put forward extremely high requirements for the accuracy of etching processes and the purity of etching solutions as chip manufacturing processes move towards smaller nanometer levels. Trace impurities in conventional etching solutions can remain during the chip etching process, causing defects such as short circuits and open circuits in the chip circuit, seriously affecting the chip yield rate. The customer requires an ultra-high purity etching solution with impurity content controlled at ppb (parts per billion) level, and a uniform and controllable etching rate to meet the high-precision etching requirements of complex chip circuit structures.

Customized Solution: 

We have invested a lot of resources to establish an ultra clean production workshop and adopted advanced multi-stage purification technology. Starting from the selection of raw materials, high-purity raw materials are strictly screened, and metal ions, organic matter, particle impurities, etc. are removed from the raw materials through multiple ion exchange, precision filtration, vacuum distillation and other technologies. During the production process, a real-time online monitoring system is used to accurately control the composition and concentration of the etching solution, ensuring the consistency of each batch of products. At the same time, a new type of etching aid has been developed to optimize the etching reaction kinetics, enabling the etching rate to be accurately adjusted over a large range according to the requirements of chip manufacturing processes, while maintaining the uniformity of the etching process.

Implementation Effect: 

After the customer used customized high-purity etching solution, the yield rate of chip manufacturing increased from 70% to over 90%. The edges of the etched chip circuit are neat and smooth, with no residual impurities or etching defects, meeting the requirements of advanced process technology for 5nm and below. Assisted customers in significantly reducing production costs, enhancing product competitiveness, and successfully helping them occupy a leading position in the high-end chip market. The two parties established a long-term exclusive partnership to jointly promote continuous innovation in chip manufacturing processes.